Tool Data
Document Type
Technical Report
Date of this Version
5-1-2018
Facility
Quattrone Nanofabrication Facility
Abstract
The alignment error of Elinox ELS-7500EX E-beam Lithography system is examined, as a project of Graduate Student Fellow Program. This report shows the alignment error of 60 and 30 nm in the x- and y-direction, respectively, confirming the tool specification of 60 nm alignment error.
Creative Commons License
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Keywords
alignment error Elionix ELS-7500EX
Date Posted: 01 May 2018
This document has been peer reviewed.