Tool Data

Document Type

Technical Report

Date of this Version

5-1-2018

Facility

Quattrone Nanofabrication Facility

Abstract

The alignment error of Elinox ELS-7500EX E-beam Lithography system is examined, as a project of Graduate Student Fellow Program. This report shows the alignment error of 60 and 30 nm in the x- and y-direction, respectively, confirming the tool specification of 60 nm alignment error.

Creative Commons License

Creative Commons Attribution-Share Alike 4.0 License
This work is licensed under a Creative Commons Attribution-Share Alike 4.0 License.

Keywords

alignment error Elionix ELS-7500EX

Included in

Engineering Commons

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Date Posted: 01 May 2018

This document has been peer reviewed.

 

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