Alignment Error Examination of Elionix E-Beam Writer ELS-7500EX

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dc.contributor.authorLi, Yangshanshan
dc.coverage.locationQuattrone Nanofabrication Facility
dc.date2023-05-17T19:59:06.000
dc.date.accessioned2023-05-23T01:20:25Z
dc.date.available2023-05-23T01:20:25Z
dc.date.issued2018-05-01
dc.date.submitted2018-05-01T08:20:51-07:00
dc.description.abstractThe alignment error of Elinox ELS-7500EX E-beam Lithography system is examined, as a project of Graduate Student Fellow Program. This report shows the alignment error of 60 and 30 nm in the x- and y-direction, respectively, confirming the tool specification of 60 nm alignment error.
dc.identifier.urihttps://repository.upenn.edu/handle/20.500.14332/45960
dc.legacy.articleid1044
dc.legacy.fulltexturlhttps://repository.upenn.edu/cgi/viewcontent.cgi?article=1044&context=scn_tooldata&unstamped=1
dc.rights.urihttp://creativecommons.org/licenses/by-sa/4.0/
dc.source.issue44
dc.source.journalTool Data
dc.source.peerreviewedtrue
dc.source.statuspublished
dc.subject.otheralignment error Elionix ELS-7500EX
dc.subject.otherEngineering
dc.titleAlignment Error Examination of Elionix E-Beam Writer ELS-7500EX
dc.typeReport
digcom.contributor.authorisAuthorOfPublication|email:liyangsh@seas.upenn.edu|institution:University of Pennsylvania|Li, Yangshanshan
digcom.identifierscn_tooldata/44
digcom.identifier.contextkey12050497
digcom.identifier.submissionpathscn_tooldata/44
digcom.typereport
dspace.entity.typePublication
relation.isAuthorOfPublication8b769148-f263-4f47-9ba6-80f2a565aaf4
relation.isAuthorOfPublication.latestForDiscovery8b769148-f263-4f47-9ba6-80f2a565aaf4
upenn.schoolDepartmentCenterTool Data
upenn.schoolDepartmentCenterQuattrone Nanofabrication Facility
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