Document Type
Technical Report
Date of this Version
2-7-2017
Facility
Quattrone Nanofabrication Facility
Abstract
This report discusses the deposition process of SiO2 using the Oxford System 100 PECVD.
Date Posted: 07 May 2016
Technical Report
2-7-2017
Quattrone Nanofabrication Facility
This report discusses the deposition process of SiO2 using the Oxford System 100 PECVD.
Date Posted: 07 May 2016