Patel, Raj
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Publication Plasma Enhanced Chemical Vapor Deposition (PECVD) of Silicon Nitride (SiNx) Using Oxford Instruments System 100 PECVD(2017-02-28) Metzler, Meredith; Patel, RajThis report discusses the deposition process of SiNx using the Oxford System 100 PECVD.Publication Plasma Enhanced Chemical Vapor Deposition (PECVD) of Silicon Dioxide (SiO2) Using Oxford Instruments System 100 PECVD(2017-02-07) Metzler, Meredith; Patel, RajThis report discusses the deposition process of SiO2 using the Oxford System 100 PECVD.Publication