High Contrast 50kV E-Beam Lithography for HSQ atop Diamond using ESPACER for Spin-On Charge Dissipation
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Protocols and Reports
Quattrone Nanofabrication Facility
Quattrone Nanofabrication Facility
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Nanotechnology Fabrication
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Abstract
A high contrast HSQ process atop diamond is presented. A water soluable spin-on conductive layer called ESPACER is used as a charge dissipation layer in lieu of a metal thin film.
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2016-03-11