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Grote, Richard R.
Grote, Richard R.
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Bassett, Lee C.
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Grote, Richard R.
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Lopez, Gerald G.
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Nanotechnology Fabrication
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2016
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Publication
High Contrast 50kV E-Beam Lithography for HSQ atop Diamond using ESPACER for Spin-On Charge Dissipation
(
2016-03-11
)
Grote, Richard R.
;
Bassett, Lee C.
;
Lopez, Gerald G.
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A high contrast HSQ process atop diamond is presented. A water soluable spin-on conductive layer called ESPACER is used as a charge dissipation layer in lieu of a metal thin film.
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