Plasma Enhanced Chemical Vapor Deposition (PECVD) of Silicon Nitride (SiNx) Using Oxford Instruments System 100 PECVD
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Quattrone Nanofabrication Facility
Quattrone Nanofabrication Facility
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Nanoscience and Nanotechnology
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Abstract
This report discusses the deposition process of SiNx using the Oxford System 100 PECVD.
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2017-02-28