Plasma Enhanced Chemical Vapor Deposition (PECVD) of Silicon Dioxide (SiO2) Using Oxford Instruments System 100 PECVD
Loading...
Penn collection
Tool Data
Quattrone Nanofabrication Facility
Quattrone Nanofabrication Facility
Degree type
Discipline
Subject
Nanoscience and Nanotechnology
Funder
Grant number
License
Copyright date
Distributor
Related resources
Contributor
Abstract
This report discusses the deposition process of SiO2 using the Oxford System 100 PECVD.
Advisor
Date Range for Data Collection (Start Date)
Date Range for Data Collection (End Date)
Digital Object Identifier
Series name and number
Publication date
2017-02-07