Wood, Steven
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Publication MicroChem S1800 Series Resist Application onto Si(2016-02-18) Wood, Steven; LOPEZ, GERALD GThe Quattrone Nanofabrication Facility standard operating procedure for the application of MicroChem S1800 series resist onto an Si wafer is provided in this document.Publication Reactive Ion Etch (RIE) of Silicon and ZEP520A Resist Mask with Tetrafluoromethane (CF4) Using Oxford 80 Plus(2016-05-12) Wood, Steven; Lopez, Gerald G; Metzler, MeredithThis report discusses the results of etching silicon with electron beam lithography defined features in ZEP520A resist using CF4 in the Oxford 80 Plus RIE.Publication Heidelberg DWL66+ S1805 Contrast Curves(2016-02-04) Wood, Steven; Lopez, Gerald GAccurately gauge the optimal machine setting for MicroChem S1805 using the Heidelberg DWL 66+ and obtain contrast curves based on the 2mm and 10mm writehead.Publication SUSS MicroTec MA6 Gen3 – MicroChem SPR-220 7.0 Thickness vs. Dose-to-Clear and Contrast Curve Data(2016-04-27) Wood, Steven; Lopez, Gerald GThe SOP for MicroChem SPR-220 7.0 at the Quattrone Nanofabrcation Facility is provided along with thickness vs. dose-to-clear and contrast curve data. The document is intended to provide a starting point when using MicroChem SPR-220 7.0.Publication Heidelberg DWL66+ S1813 Contrast Curves(2016-02-04) Wood, Steven; LOPEZ, GERALD GAccurately gauge the optimal machine setting for MicroChem S1813 using the Heidelberg DWL 66+ and plot the contrast curves for the 2mm and 10mm writeheads.Publication Heidelberg DWL66+ S1818 Contrast Curves(2016-02-04) Wood, Steven; LOPEZ, GERALD GAccurately gauge the optimal machine setting for MicroChem S1818 using the Heidelberg DWL 66+ and plot the contrast curves for the 2mm and 10mm writeheads.Publication SUSS MicroTec MA6 Gen3 - S1818 Contrast Curve Data(2016-03-04) Bryan, Jonathan; Wood, Steven; LOPEZ, GERALD GPublication SUSS MicroTec MA6 Gen3 - S1813 Contrast Curve Data(2016-03-04) Bryan, Jonathan; Wood, Steven; Lopez, Gerald G