Tool Data

Document Type

Technical Report

Date of this Version



Quattrone Nanofabrication Facility


This report shows deposition characteristics for aluminum oxide (Al2O3), hafnium oxide (HfO2), and titanium dioxide (TiO2) films deposited in the Cambridge Nanotech Savannah system. A brief study of the presence of pinholes in these films is also presented.



Date Posted: 28 April 2016


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