Document Type
Technical Report
Date of this Version
4-28-2016
Facility
Quattrone Nanofabrication Facility
Abstract
This report shows deposition characteristics for aluminum oxide (Al2O3), hafnium oxide (HfO2), and titanium dioxide (TiO2) films deposited in the Cambridge Nanotech Savannah system. A brief study of the presence of pinholes in these films is also presented.
Date Posted: 28 April 2016