Document Type
Technical Report
Date of this Version
10-20-2017
Facility
Quattrone Nanofabrication Facility
Abstract
To test the flaw propagation to features of SU-8 resist in the presence of 360nm long pass (LP) filter during exposure.
Creative Commons License
This work is licensed under a Creative Commons Attribution-Share Alike 4.0 License.
Date Posted: 20 October 2017