Directed Self-Assembly of Block Copolymer, No1
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Protocols and Reports
Quattrone Nanofabrication Facility
Quattrone Nanofabrication Facility
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directed self-assembly
block-copolymer
grafting
hydroxylated silicon oxide
Biochemical and Biomolecular Engineering
Biological and Chemical Physics
Membrane Science
Nanoscience and Nanotechnology
Other Chemistry
Physical Chemistry
Polymer and Organic Materials
Polymer Chemistry
Polymer Science
block-copolymer
grafting
hydroxylated silicon oxide
Biochemical and Biomolecular Engineering
Biological and Chemical Physics
Membrane Science
Nanoscience and Nanotechnology
Other Chemistry
Physical Chemistry
Polymer and Organic Materials
Polymer Chemistry
Polymer Science
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Abstract
The PS-rich and neutral PS-b-PMMA block copolymer (BCP) films were spin coated on the neutral random copolymer hydroxyl-terminated PS-r-PMMA layers grafted on the native oxide and 50 nm thick PECVD amorphous silicon oxide layers. Relationship between the grafting density of BCP and surface density of hydroxyl moiety on silicon oxide is discussed. Furthermore, optimization of annealing BCP films is reported, and wetted and de-wetted BCP films are shown in optical microscope images. In addition, finger print and nanopore structures of BCP films are also indicated in SEM images.
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2016-08-01