Reactive Ion Etching Selectivity of Si/SiO2: Comparing of two fluorocarbon gases CHF3 and CF4

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dc.contributor.authorZhang, Meiyue
dc.contributor.authorWatson, Pat
dc.coverage.locationQuattrone Nanofabrication Facility
dc.date2023-05-17T21:47:42.000
dc.date.accessioned2023-05-23T01:19:01Z
dc.date.available2023-05-23T01:19:01Z
dc.date.issued2019-03-01
dc.date.submitted2019-03-01T08:32:31-08:00
dc.description.abstractTwo reactive ion etching (RIE) processes were studied to show the relative etch selectivity between SiO2 and Si using two fluorocarbon gases, CF4 and CHF3. Results show that CHF3 gives better selectivity (16:1) over CF4 (1.2 :1). On the other hand, the etch rate of SiO2 of CF4 is approximately 52.8 nm/min, faster than CHF3 (32.4 nm/min).
dc.identifier.urihttps://repository.upenn.edu/handle/20.500.14332/45874
dc.legacy.articleid1055
dc.legacy.fulltexturlhttps://repository.upenn.edu/cgi/viewcontent.cgi?article=1055&context=scn_protocols&unstamped=1
dc.source.issue55
dc.source.journalProtocols and Reports
dc.source.peerreviewedtrue
dc.source.statuspublished
dc.subject.otherReactive ion etching
dc.subject.otherRIE
dc.subject.otherSi
dc.subject.otherSiO2
dc.subject.otherCHF3
dc.subject.otherCF4
dc.subject.otherSelectivity
dc.subject.otherBiomedical
dc.subject.otherBiomedical Devices and Instrumentation
dc.subject.otherCeramic Materials
dc.subject.otherElectrical and Electronics
dc.subject.otherElectromagnetics and Photonics
dc.subject.otherElectro-Mechanical Systems
dc.subject.otherElectronic Devices and Semiconductor Manufacturing
dc.subject.otherMembrane Science
dc.subject.otherNanotechnology Fabrication
dc.subject.otherOther Biomedical Engineering and Bioengineering
dc.subject.otherSemiconductor and Optical Materials
dc.subject.otherStructural Materials
dc.subject.otherSystems and Integrative Engineering
dc.subject.otherVLSI and Circuits, Embedded and Hardware Systems
dc.titleReactive Ion Etching Selectivity of Si/SiO2: Comparing of two fluorocarbon gases CHF3 and CF4
dc.typeReport
digcom.identifierscn_protocols/55
digcom.identifier.contextkey13930557
digcom.identifier.submissionpathscn_protocols/55
digcom.typereport
dspace.entity.typePublication
relation.isAuthorOfPublicationbbd10dee-9243-4952-8fba-32c456f1e501
relation.isAuthorOfPublicationd8364f8d-c285-4db7-8953-ac4f5e3fdbde
relation.isAuthorOfPublication.latestForDiscoverybbd10dee-9243-4952-8fba-32c456f1e501
upenn.schoolDepartmentCenterProtocols and Reports
upenn.schoolDepartmentCenterQuattrone Nanofabrication Facility
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