Reactive Ion Etch (RIE) of Silicon Dioxide (SiO2) with Tetrafluoromethane (CF4)
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Quattrone Nanofabrication Facility
Quattrone Nanofabrication Facility
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Nanoscience and Nanotechnology
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Abstract
This report discusses the CF4 etch process of SiO2 using the Oxford 80 Plus RIE.
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2016-05-07