Chaudhary, Rimjhim
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Publication Comparison between Silicon Nanopillars Prepared by Bosch Process and Metal Assisted Chemical Etching(2018-05-29) Chaudhary, RimjhimNanopillars fabricated by Metal Assisted Chemical Etching (MacEtch) wet-etch process have been compared with those by Bosch dry-etch process. The Bosch process in this study gave vertical nanopillars with smooth side walls, which was better than the typical Bosch process. However, the verticality of the nanopillars depended on the location within the wafer where they were etched. On the other hand, MacEtch process gave a very consistent feature from 100 to 1000 nm diameter using 20 nm thick Au film without an expensive etching tool. The present technical report discuss the difference between MacEtch and Bosch processes.Publication Fabrication of High Aspect Ratio Nanopillars using Metal Assisted Chemical Etching(2019-03-14) Chaudhary, Rimjhim; Yamamoto, HiromichiThis report describes fabrication of 100 to 200 nm diameter silicon nanopillars with ~140:1 aspect ratio using Metal Assisted Chemical Etching (MacEtch) process giving a high etch rate of ~930 nm/min, and also discusses an area dependence of the etch uniformity and rate, using 0.5 and 1 µm diameter, and 2 mm x 2 mm Au films. It is found that the etching using the Au film with the area of 0.2 µm2 is uniform, but that with the area of more than 0.8 µm2 is not, suggesting that the diffusion length of the species in MacEtch reaction underneath the Au film is ~300 nm.