PMMA A2 Contrast Curves

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dc.contributor.authorLopez, Gerald G.
dc.contributor.authorAzadi, Mohsen
dc.date2023-05-17T16:17:32.000
dc.date.accessioned2023-05-23T01:18:41Z
dc.date.available2023-05-23T01:18:41Z
dc.date.issued2016-12-16
dc.date.submitted2016-12-16T07:55:56-08:00
dc.description.abstractThis report documents the contrast curves for the PMMA A2 electron beam lithography resist from MicroChem. Spin curves for PMMA A2 can be found in previous work. The aim is to provide an approximate clearing and base dose for the PMMA A2 standard process at the Singh Center for Nanotechnology.
dc.identifier.urihttps://repository.upenn.edu/handle/20.500.14332/45853
dc.legacy.articleid1035
dc.legacy.fulltexturlhttps://repository.upenn.edu/cgi/viewcontent.cgi?article=1035&context=scn_protocols&unstamped=1
dc.legacy.nativeurlhttps://repository.upenn.edu/context/scn_protocols/article/1035/type/native/viewcontent
dc.source.issue35
dc.source.journalProtocols and Reports
dc.source.statuspublished
dc.subject.otherPMMA A2
dc.subject.otherContrast Curves
dc.subject.otherNanoscience and Nanotechnology
dc.titlePMMA A2 Contrast Curves
dc.typeReport
digcom.identifierscn_protocols/35
digcom.identifier.contextkey9481415
digcom.identifier.submissionpathscn_protocols/35
digcom.typereport
dspace.entity.typePublication
relation.isAuthorOfPublication4f0ea4c9-92a2-447b-a80c-204bed9b53a3
relation.isAuthorOfPublication958f1844-c7c0-4be4-9498-1056e33b3fd8
relation.isAuthorOfPublication.latestForDiscovery4f0ea4c9-92a2-447b-a80c-204bed9b53a3
upenn.schoolDepartmentCenterProtocols and Reports
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