Farnan, Dale

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  • Publication
    Effect of Developer Temperature on Photoresist Contrast in Grayscale Lithography
    (2021-05-12) Farnan, Dale; Watson, George Patrick
    SPR 220-3 photoresist was spin-coated onto a silicon wafer, exposed using a Heidelberg DWL66+ laserwriter at different laser powers, and developed at different temperatures. The effect of developer temperature on photoresist contrast was examined. Results show that increasing developer temperature decreased photoresist contrast and increased required dose.
  • Publication
    How to Make Chips with Nanofabrication | University of Pennsylvania
    (2020-11-10) Hoang, Lauren; Idris, Abbas; Farnan, Dale; Macera, Felice; Wallace, Ashely; Jones, David; Kim, Gyuseok
    The Singh Center for Nanotechnology and LRSM at the University of Pennsylvania demonstrate the nanofabrication process to make chips using lithography, deposition and etch. Fabricated chips were characterized with reflectometry and opticalmicroscopy. For more information: https://www.nano.upenn.edu/ https://www.nnci.net/