de Villafranca, Glen

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2017 - 20183
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  • Publication
    CSAR 62 Contrast Curves
    (2017-12-21) Azadi, Mohsen; Griggs, Georgia; de Villafranca, Glen; Lopez, Gerald
  • Publication
    DisCharge: Spin-On Anti-Charging Agent for Electron Beam Lithography
    (2018-03-29) Lopez, Gerald G; de Villafranca, Glen
    This report documents the chemical DisCharge from DisChem, Inc. used as an anti-charging agent for electron beam lithography at the University of Pennsylvania Singh Center for Nanotechnology Quattrone Nanofabrication Facility. Charge accumulation while exposing atop an electrically insulating substrate can severely impact positional accuracy of the beam yielding poor litho. Using DisCharge has been shown to reduce charge accumulation for insulating substrates such as fused silica pieces, glass slides, and PDMS for positive resists such as PMMA, ZEP520A, CSAR 62 and mr-PosEBR.
  • Publication
    CSAR 62 Spin Curve
    (2018-12-21) Azadi, Mohsen; Griggs, Georgia; de Villafranca, Glen; Lopez, Gerald