Tool Data
Document Type
Technical Report
Date of this Version
2-20-2017
Facility
Quattrone Nanofabrication Facility
Date Posted: 20 February 2017
Technical Report
2-20-2017
Quattrone Nanofabrication Facility
Date Posted: 20 February 2017
Comments
The purpose of this document is to show the optimization of the PECVD process for amorphous silicon (a-Si) using the Taguchi L9 Design of Experiments (DOE).