Tool Data

Document Type

Technical Report

Date of this Version

2-20-2017

Comments

The purpose of this document is to show the optimization of the PECVD process for amorphous silicon (a-Si) using the Taguchi L9 Design of Experiments (DOE).

Facility

Quattrone Nanofabrication Facility

Share

COinS
 

Date Posted: 20 February 2017

 

To view the content in your browser, please download Adobe Reader or, alternately,
you may Download the file to your hard drive.

NOTE: The latest versions of Adobe Reader do not support viewing PDF files within Firefox on Mac OS and if you are using a modern (Intel) Mac, there is no official plugin for viewing PDF files within the browser window.