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Publication Statistical Process Control of Alignment Module of NX2600(2015-05-12) Yamamoto, HiromichiPublication Reactive Ion Etch (RIE) of Silicon Nitride (SiNx) with Tetrafluoromethane (CF4)(2016-05-07) Metzler, MeredithThis report discusses the CF4 etch process of SiNx using the Oxford 80 Plus RIE.Publication Statistical Process Control of 80plus Reactive Ion Etcher(2015-05-06) Yamamoto, HiromichiPublication Reactive Ion Etch (RIE) of Silicon and ZEP520A Resist Mask with Tetrafluoromethane (CF4) Using Oxford 80 Plus(2016-05-12) Wood, Steven; Lopez, Gerald G; Metzler, MeredithThis report discusses the results of etching silicon with electron beam lithography defined features in ZEP520A resist using CF4 in the Oxford 80 Plus RIE.Publication Publication Deposition Rates 2 on PVD75 DC/RF Magnetron Sputterer(2015-05-01) Turakhia, DhruvPublication Reactive Ion Etch (RIE) of Silicon Nitride (SiNx) with Trifluoromethane and Oxygen (CHF3/O2)(2016-05-07) Metzler, MeredithThis report discusses the CHF3/O2 etch process of SiNx using the Oxford 80 Plus RIE.Publication Preparation of High Stress Silicon Nitride film using PECVD(2015-05-06) Pi, Chia-HsingPublication Atomic Layer Deposition-1, growth rate and uniformity of Al2O3(2015-04-25) Turakhia, DhruvPublication Temperature dependence of ALD SiO2 growth(2015-04-25) Nie, Zisong