Protocols and Reports

Document Type

Technical Report

Date of this Version

9-25-2020

Facility

Quattrone Nanofabrication Facility

Abstract

This report describes the fabrication of a long-range orderly nanopore structure in free-standing siliconnitride membranes using electron-beam lithography (EBL). The parameter setting and challenges of eachstep are discussed.

Creative Commons License

Creative Commons Attribution-Share Alike 4.0 License
This work is licensed under a Creative Commons Attribution-Share Alike 4.0 License.

Keywords

Nanopore, Electron-beam Lithography, Silicon Nitride

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Date Posted: 25 September 2020

This document has been peer reviewed.

 

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