Protocols and Reports
Document Type
Technical Report
Date of this Version
9-25-2020
Facility
Quattrone Nanofabrication Facility
Abstract
This report describes the fabrication of a long-range orderly nanopore structure in free-standing siliconnitride membranes using electron-beam lithography (EBL). The parameter setting and challenges of eachstep are discussed.
Creative Commons License
This work is licensed under a Creative Commons Attribution-Share Alike 4.0 International License.
Keywords
Nanopore, Electron-beam Lithography, Silicon Nitride
Date Posted: 25 September 2020
This document has been peer reviewed.