Protocols and Reports

Document Type

Technical Report

Date of this Version



Quattrone Nanofabrication Facility


This report describes the fabrication of a long-range orderly nanopore structure in free-standing siliconnitride membranes using electron-beam lithography (EBL). The parameter setting and challenges of eachstep are discussed.

Creative Commons License

Creative Commons Attribution-Share Alike 4.0 International License
This work is licensed under a Creative Commons Attribution-Share Alike 4.0 International License.


Nanopore, Electron-beam Lithography, Silicon Nitride



Date Posted: 25 September 2020

This document has been peer reviewed.


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