Date of this Version
Quattrone Nanofabrication Facility
This report describes the fabrication of a long-range orderly nanopore structure in free-standing siliconnitride membranes using electron-beam lithography (EBL). The parameter setting and challenges of eachstep are discussed.
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Nanopore, Electron-beam Lithography, Silicon Nitride
Date Posted: 25 September 2020
This document has been peer reviewed.