Nanopillars fabricated by Metal Assisted Chemical Etching (MacEtch) wet-etch process have been compared with those by Bosch dry-etch process. The Bosch process in this study gave vertical nanopillars with smooth side walls, which was better than the typical Bosch process. However, the verticality of the nanopillars depended on the location within the wafer where they were etched. On the other hand, MacEtch process gave a very consistent feature from 100 to 1000 nm diameter using 20 nm thick Au film without an expensive etching tool. The present technical report discuss the difference between MacEtch and Bosch processes.