Protocols and Reports
Title
Comparison between Silicon Nanopillars Prepared by Bosch Process and Metal Assisted Chemical Etching
Document Type
Technical Report
Date of this Version
5-29-2018
Facility
Quattrone Nanofabrication Facility
Abstract
Nanopillars fabricated by Metal Assisted Chemical Etching (MacEtch) wet-etch process have been compared with those by Bosch dry-etch process. The Bosch process in this study gave vertical nanopillars with smooth side walls, which was better than the typical Bosch process. However, the verticality of the nanopillars depended on the location within the wafer where they were etched. On the other hand, MacEtch process gave a very consistent feature from 100 to 1000 nm diameter using 20 nm thick Au film without an expensive etching tool. The present technical report discuss the difference between MacEtch and Bosch processes.
Creative Commons License
This work is licensed under a Creative Commons Attribution-Share Alike 4.0 International License.
Keywords
Metal Assisted Chemical Etching, Bosch Process, Nanopillar
Date Posted: 29 May 2018
This document has been peer reviewed.