Singh Center for Nanotechnology
Protocols and Reports
The Measurement of Residual Film Stress in Deposited Thin Films Using the KLA-Tencor 2D/3D P7 Surface Profilometer
Roman Mays, University of PennsylvaniaFollow
The purpose of this document is to show how to use the surface profilometer to measure residual film stress in deposited thin films.
Quattrone Nanofabrication Facility
Since February 20, 2017
Nanoscience and Nanotechnology Commons
Date Posted: 20 February 2017
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