Document Type

Technical Report

Date of this Version

12-16-2016

Abstract

This report documents the contrast curves for the PMMA A2 electron beam lithography resist from MicroChem. Spin curves for PMMA A2 can be found in previous work. The aim is to provide an approximate clearing and base dose for the PMMA A2 standard process at the Singh Center for Nanotechnology.

Keywords

PMMA A2, Contrast Curves

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Date Posted: 16 December 2016

 

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