Title
Document Type
Technical Report
Date of this Version
12-16-2016
Abstract
This report documents the contrast curves for the PMMA A2 electron beam lithography resist from MicroChem. Spin curves for PMMA A2 can be found in previous work. The aim is to provide an approximate clearing and base dose for the PMMA A2 standard process at the Singh Center for Nanotechnology.
Keywords
PMMA A2, Contrast Curves
Date Posted: 16 December 2016