Document Type

Technical Report

Date of this Version

12-16-2016

Abstract

This report documents the spin curves for the PMMA A2 and A4 electron beam lithography resists from MicroChem. The aim is to provide a spin curve reference for the A2 and A4 dilutions at the Singh Center for Nanotechnolgy Quattrone Nanofabrication Facility.

Keywords

PMMA, A2, A4, PMMA A2, PMMA A4, Spin Curves, Curve, Spin, Dilution

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Date Posted: 16 December 2016

 

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