Document Type
Technical Report
Date of this Version
12-16-2016
Abstract
This report documents the spin curves for the PMMA A2 and A4 electron beam lithography resists from MicroChem. The aim is to provide a spin curve reference for the A2 and A4 dilutions at the Singh Center for Nanotechnolgy Quattrone Nanofabrication Facility.
Keywords
PMMA, A2, A4, PMMA A2, PMMA A4, Spin Curves, Curve, Spin, Dilution
Date Posted: 16 December 2016