Title
Document Type
Technical Report
Date of this Version
12-16-2016
Abstract
This report documents the contrast curves for the ZEP520A electron beam lithography resist from ZEON Chemicals. Dilution by weight of ZEP520A vs spin speed from 1000 to 6000 rpm was generated in previous work. The aim is to provide an approximate clearing and base dose for the ZEP520A standard process at the Singh Center for Nanotechnology.
Keywords
ZEP520A, contrast curve, o-xylene, room temperature, clearing dose, base dose
Date Posted: 16 December 2016