Document Type

Technical Report

Date of this Version

12-16-2016

Abstract

This report documents the contrast curves for the ZEP520A electron beam lithography resist from ZEON Chemicals. Dilution by weight of ZEP520A vs spin speed from 1000 to 6000 rpm was generated in previous work. The aim is to provide an approximate clearing and base dose for the ZEP520A standard process at the Singh Center for Nanotechnology.

Keywords

ZEP520A, contrast curve, o-xylene, room temperature, clearing dose, base dose

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Date Posted: 16 December 2016

 

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