Document Type
Technical Report
Date of this Version
10-6-2016
Facility
Quattrone Nanofabrication Facility
Abstract
This technical report describes the process of etching silicon dioxide (SiO2) and Microchem S1800 resist using the Oxford 80 Plus Reactive Ion Etch (RIE) system.
Since October 06, 2016
COinS
Date Posted: 06 October 2016
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