Protocols and Reports
Document Type
Technical Report
Date of this Version
5-12-2016
Facility
Quattrone Nanofabrication Facility
Creative Commons License
This work is licensed under a Creative Commons Attribution-Share Alike 4.0 International License.
Keywords
self-aligned double pattern
Included in
Industrial Technology Commons, Nanoscience and Nanotechnology Commons, Other Engineering Science and Materials Commons, Other Materials Science and Engineering Commons
Date Posted: 12 May 2016