Document Type
Technical Report
Date of this Version
2-18-2016
Facility
Quattrone Nanofabrication Facility
Abstract
The Quattrone Nanofabrication Facility standard operating procedure for the application of MicroChem S1800 series resist onto an Si wafer is provided in this document.
Keywords
S1800, positive resist, SURPASS
Downloads Since February 18, 2016
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Date Posted: 18 February 2016
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