Document Type
Technical Report
Date of this Version
2-4-2016
Facility
Quattrone Nanofabrication Facility
Abstract
Accurately gauge the optimal machine setting for MicroChem S1805 using the Heidelberg DWL 66+ and obtain contrast curves based on the 2mm and 10mm writehead.
Keywords
S1805
Included in
Electronic Devices and Semiconductor Manufacturing Commons, Nanotechnology Fabrication Commons
Date Posted: 18 February 2016