Document Type
Technical Report
Date of this Version
2-4-2016
Facility
Quattrone Nanofabrication Facility
Abstract
Accurately gauge the optimal machine setting for MicroChem S1813 using the Heidelberg DWL 66+ and plot the contrast curves for the 2mm and 10mm writeheads.
Keywords
S1813
Included in
Electronic Devices and Semiconductor Manufacturing Commons, Nanotechnology Fabrication Commons
Date Posted: 18 February 2016