Protocols and Reports

Protocols and Reports

 

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Submissions from 2023

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IPG Green Laser Micromachining SOP, Eric Johnston

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Heidelberg DWL66+ Laser Writer (LW-01) Standard Operating Procedure, David J. Jones

Submissions from 2022

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Deposition and Etch Characterization of Low Stress Silicon Nitride Films Deposited via LPCVD, Mohsen Azadi

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KJLC PVD75 E-beam Evaporator (PVD-04) standard operating procedure, David J. Jones

Submissions from 2021

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ALD deposition of SiO2 using BDEAS and Ozone precursors, Mohsen Azadi

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Improving Healthspan through Patient-Derived Artificial Organs from Induced Pluripotent Stem Cells and Two-Photon Polymerization, Connor Espenshade

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Effect of Developer Temperature on Photoresist Contrast in Grayscale Lithography, Dale Farnan and George Patrick Watson

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Optimization of Bilayer Lift-Off Process to Enable the Gap Size of 1μm Using LOR 3A and S1813, Yeonjoon Suh and George Patrick Watson

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How to cleave wafers: LatticeGear protocol, Shenshen Wan and George Patrick Watson

Submissions from 2020

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Inkjet Printing of Graphene, Lauren Hoang, Hiromichi Yamamoto, Yeonjoon Suh, and George Patrick Watson

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Progress Report III: Fabrication of Nanopores in Silicon Nitride Membranes using Electron-beam Lithography, Mingxuan Ma and Hiromichi Yamamoto

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Stress in Silicon Oxide Thin Films Grown by Dry Thermal Oxidation, Manisha Muduli and Hiromichi Yamamoto

Submissions from 2019

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Fabrication of High Aspect Ratio Nanopillars using Metal Assisted Chemical Etching, Rimjhim Chaudhary and Hiromichi Yamamoto

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Fabrication of Organic Thin Film Transistors using Inkjet Printing of PEDOT:PSS, Sourajit Das, Akshaya Venkatakrishnan, Hiromichi Yamamoto, and George Patrick Watson

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Microfluidics for Medical Research, Eric D. Johnston

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Progress Report I: Fabrication of Nanopores in Silicon Nitride Membranes using Self-Assembly of PS-b-PMMA, Unnati Joshi, Vishal Venkatesh, and Hiromichi Yamamoto

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Influence of NaOH Concentration on Transfer Process of Graphene, Francisco Saldana, Chengyu Wen, and George Patrick Watson

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Effect of Annealing on the Contact Resistance of Aluminum on a p-type Substrate, Shrey Shah and George Patrick Watson

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Progress Report II: Fabrication of Nanopores in Silicon Nitride Membrane using Self-Assembly of PS-b-PMMA: Nanopore Pattern Transfer to the Si substrate, Kodai Watanabe, Unnati Joshi, and Hiromichi Yamamoto

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Correction of pattern size deviations in the fabrication of photomasks made with a laser direct-writer, Ningzhi Xie and George Patrick Watson

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Dynamics of Directed Self-Assembly of PS-b-PMMA during Solvent Annealing, Hiromichi Yamamoto

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Reactive Ion Etching Selectivity of Si/SiO2: Comparing of two fluorocarbon gases CHF3 and CF4, Meiyue Zhang and Pat Watson

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CdSe Quantum Dots Synthesis Laboratory Course for High School Students, Danlin Zuo, Gyuseok Kim, and David Jones

Submissions from 2018

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CSAR 62 Spin Curve, Mohsen Azadi, Georgia Griggs, Glen de Villafranca, and Gerald Lopez

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Comparison between Silicon Nanopillars Prepared by Bosch Process and Metal Assisted Chemical Etching, Rimjhim Chaudhary

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Surface Roughness Dependence of Inkjet Printing of Ag Nanoparticles, Ming Yuan Chuang

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Surface Treatment and Adhesion Study, Maegan DeLessio and Pat Watson

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DisCharge: Spin-On Anti-Charging Agent for Electron Beam Lithography, Gerald G. Lopez Ph.D. and Glen de Villafranca

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KMPR Master Fabrication Protocol, Justin Wen

Submissions from 2017

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Inkjet Printing of Ag Nanoparticles using Dimatix Inkjet Printer, No 1, Amal Abbas and Inayat Bajwa

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CSAR 62 Contrast Curves, Mohsen Azadi, Georgia Griggs, Glen de Villafranca, and Gerald Lopez

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MicroChem S1818 Contrast Curve Optimization, Mohsen Azadi and Gerald Lopez

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Inkjet Printing of Ag Nanoparticles using Dimatix Inkjet Printer, No 2, Ming Yuan Chuang

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Mask Flaw Propagation Using 360nm Long Pass Filter, Ram Surya Gona and Eric D. Johnston

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SU-8 Post Development Bake (Hard Bake) Study, Ram Surya Gona and Eric D. Johnston

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Effect of Post-Development Bake on Adhesion of SU-8, Eric D. Johnston and Ram Surya Gona

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PDMS Shrinkage, Abhishek Kalpattu

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Examination of the Stoney Equation and a Practical Determination of the Error in Residual Film Stress Measurements, Roman Mays

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The Measurement of Residual Film Stress in Deposited Thin Films Using the KLA-Tencor 2D/3D P7 Surface Profilometer, Roman Mays

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Troubleshooting on the sample preparation for SU-8 to SU-8 wafer level bonding, Samagata Sen, Saurav Bose, and Shubham Sethi

Submissions from 2016

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Characterization of Silicon Deep Reactive Ion Etching Using the SPTS Rapier, Mohsen Azadi, Meredith Metzler, and Gerald G. Lopez

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Characterization of Silicon Dioxide (SiO2) and Microchem S1800 Resist Etching Using Oxford 80 Plus RIE, Mohsen Azadi, Meredith Metzler, and Gerald G. Lopez

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KOH etching of (100) Si wafer, No 1, Inayat Bajwa

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KOH etching of (100) Si wafer, No 2, Inayat Bajwa

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Metal Assisted Chemical Etching, Inayat Bajwa

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SUSS MicroTec MA6 Gen3 - S1805 Contrast Curve Data, Jonathan Bryan and GERALD G. LOPEZ

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SUSS MicroTec MA6 Gen3 - S1813 Contrast Curve Data, Jonathan Bryan, Steven Wood, and Gerald G. Lopez

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SUSS MicroTec MA6 Gen3 - S1818 Contrast Curve Data, Jonathan Bryan, Steven Wood, and GERALD G. LOPEZ

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Self-Aligned Double Pattern, No1, Yinong Cao

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High Contrast 50kV E-Beam Lithography for HSQ atop Diamond using ESPACER for Spin-On Charge Dissipation, Richard R. Grote, Lee C. Bassett, and Gerald G. Lopez

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Presentation for Lab-on-a-Chip Seminar at QNF, Eric D. Johnston

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Torrey Pines Scientific Hotplate Calibration, GERALD G. LOPEZ

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ZEP520A Spin Curves and Dilution Characterization, Gerald G. Lopez Ph.D.

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Elionix ELS-7500EX: Field Size Analysis, Gerald G. Lopez Ph.D. and Mohsen Azadi

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PMMA A2 Contrast Curves, Gerald G. Lopez Ph.D. and Mohsen Azadi

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ZEP520A Contrast Curves, Gerald G. Lopez Ph.D. and Mohsen Azadi

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PMMA A2 and A4 Spin Curves, Gerald G. Lopez Ph.D. and Mohsen Azadi

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Heidelberg DWL66+ S1805 Contrast Curves, Steven Wood and Gerald G. Lopez

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Heidelberg DWL66+ S1813 Contrast Curves, Steven Wood and GERALD G. LOPEZ

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Heidelberg DWL66+ S1818 Contrast Curves, Steven Wood and GERALD G. LOPEZ

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MicroChem S1800 Series Resist Application onto Si, Steven Wood and GERALD G. LOPEZ

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SUSS MicroTec MA6 Gen3 – MicroChem SPR-220 7.0 Thickness vs. Dose-to-Clear and Contrast Curve Data, Steven Wood and Gerald G. Lopez

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Directed Self-Assembly of Block Copolymer, No1, Hiromichi Yamamoto

Submissions from 2015

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PDMS-Glass Bonding Protocol - Technics, Ravit Dung and Justin Wen

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PDMS-PDMS Bonding Protocol - Technics, Steven Henry

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KMPR Delamination Resistance Study Report, Steven Henry and Eric Johnston

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SU-8 Delamination Resistance Study Report, Steven Henry, Eric Johnston, and Justin Wen

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Photomask Defects Report, Steven Henry and Justin Wen

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Channel Shape Study Report, Justin Wen

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PDMS-Glass Bonding Protocol - Anatech, Justin Wen

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PDMS-PDMS Bonding Protocol - Anatech, Justin Wen

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Priming Methods for PDMS Devices Study Report, Justin Wen

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Stress Fracture Study Report, Justin Wen

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T-Topping Study Report, Justin Wen