Protocols and Reports
Submissions from 2023
IPG Green Laser Micromachining SOP, Eric Johnston
Heidelberg DWL66+ Laser Writer (LW-01) Standard Operating Procedure, David J. Jones
Submissions from 2022
Deposition and Etch Characterization of Low Stress Silicon Nitride Films Deposited via LPCVD, Mohsen Azadi
KJLC PVD75 E-beam Evaporator (PVD-04) standard operating procedure, David J. Jones
Submissions from 2021
ALD deposition of SiO2 using BDEAS and Ozone precursors, Mohsen Azadi
Improving Healthspan through Patient-Derived Artificial Organs from Induced Pluripotent Stem Cells and Two-Photon Polymerization, Connor Espenshade
Effect of Developer Temperature on Photoresist Contrast in Grayscale Lithography, Dale Farnan and George Patrick Watson
Optimization of Bilayer Lift-Off Process to Enable the Gap Size of 1μm Using LOR 3A and S1813, Yeonjoon Suh and George Patrick Watson
How to cleave wafers: LatticeGear protocol, Shenshen Wan and George Patrick Watson
Submissions from 2020
Inkjet Printing of Graphene, Lauren Hoang, Hiromichi Yamamoto, Yeonjoon Suh, and George Patrick Watson
Progress Report III: Fabrication of Nanopores in Silicon Nitride Membranes using Electron-beam Lithography, Mingxuan Ma and Hiromichi Yamamoto
Stress in Silicon Oxide Thin Films Grown by Dry Thermal Oxidation, Manisha Muduli and Hiromichi Yamamoto
Submissions from 2019
Fabrication of High Aspect Ratio Nanopillars using Metal Assisted Chemical Etching, Rimjhim Chaudhary and Hiromichi Yamamoto
Fabrication of Organic Thin Film Transistors using Inkjet Printing of PEDOT:PSS, Sourajit Das, Akshaya Venkatakrishnan, Hiromichi Yamamoto, and George Patrick Watson
Microfluidics for Medical Research, Eric D. Johnston
Progress Report I: Fabrication of Nanopores in Silicon Nitride Membranes using Self-Assembly of PS-b-PMMA, Unnati Joshi, Vishal Venkatesh, and Hiromichi Yamamoto
Influence of NaOH Concentration on Transfer Process of Graphene, Francisco Saldana, Chengyu Wen, and George Patrick Watson
Effect of Annealing on the Contact Resistance of Aluminum on a p-type Substrate, Shrey Shah and George Patrick Watson
Progress Report II: Fabrication of Nanopores in Silicon Nitride Membrane using Self-Assembly of PS-b-PMMA: Nanopore Pattern Transfer to the Si substrate, Kodai Watanabe, Unnati Joshi, and Hiromichi Yamamoto
Correction of pattern size deviations in the fabrication of photomasks made with a laser direct-writer, Ningzhi Xie and George Patrick Watson
Dynamics of Directed Self-Assembly of PS-b-PMMA during Solvent Annealing, Hiromichi Yamamoto
Reactive Ion Etching Selectivity of Si/SiO2: Comparing of two fluorocarbon gases CHF3 and CF4, Meiyue Zhang and Pat Watson
CdSe Quantum Dots Synthesis Laboratory Course for High School Students, Danlin Zuo, Gyuseok Kim, and David Jones
Submissions from 2018
CSAR 62 Spin Curve, Mohsen Azadi, Georgia Griggs, Glen de Villafranca, and Gerald Lopez
Comparison between Silicon Nanopillars Prepared by Bosch Process and Metal Assisted Chemical Etching, Rimjhim Chaudhary
Surface Roughness Dependence of Inkjet Printing of Ag Nanoparticles, Ming Yuan Chuang
Surface Treatment and Adhesion Study, Maegan DeLessio and Pat Watson
DisCharge: Spin-On Anti-Charging Agent for Electron Beam Lithography, Gerald G. Lopez Ph.D. and Glen de Villafranca
KMPR Master Fabrication Protocol, Justin Wen
Submissions from 2017
Inkjet Printing of Ag Nanoparticles using Dimatix Inkjet Printer, No 1, Amal Abbas and Inayat Bajwa
CSAR 62 Contrast Curves, Mohsen Azadi, Georgia Griggs, Glen de Villafranca, and Gerald Lopez
MicroChem S1818 Contrast Curve Optimization, Mohsen Azadi and Gerald Lopez
Inkjet Printing of Ag Nanoparticles using Dimatix Inkjet Printer, No 2, Ming Yuan Chuang
Mask Flaw Propagation Using 360nm Long Pass Filter, Ram Surya Gona and Eric D. Johnston
SU-8 Post Development Bake (Hard Bake) Study, Ram Surya Gona and Eric D. Johnston
Effect of Post-Development Bake on Adhesion of SU-8, Eric D. Johnston and Ram Surya Gona
PDMS Shrinkage, Abhishek Kalpattu
Troubleshooting on the sample preparation for SU-8 to SU-8 wafer level bonding, Samagata Sen, Saurav Bose, and Shubham Sethi
Submissions from 2016
Characterization of Silicon Deep Reactive Ion Etching Using the SPTS Rapier, Mohsen Azadi, Meredith Metzler, and Gerald G. Lopez
Characterization of Silicon Dioxide (SiO2) and Microchem S1800 Resist Etching Using Oxford 80 Plus RIE, Mohsen Azadi, Meredith Metzler, and Gerald G. Lopez
KOH etching of (100) Si wafer, No 1, Inayat Bajwa
KOH etching of (100) Si wafer, No 2, Inayat Bajwa
Metal Assisted Chemical Etching, Inayat Bajwa
SUSS MicroTec MA6 Gen3 - S1805 Contrast Curve Data, Jonathan Bryan and GERALD G. LOPEZ
SUSS MicroTec MA6 Gen3 - S1813 Contrast Curve Data, Jonathan Bryan, Steven Wood, and Gerald G. Lopez
SUSS MicroTec MA6 Gen3 - S1818 Contrast Curve Data, Jonathan Bryan, Steven Wood, and GERALD G. LOPEZ
Self-Aligned Double Pattern, No1, Yinong Cao
High Contrast 50kV E-Beam Lithography for HSQ atop Diamond using ESPACER for Spin-On Charge Dissipation, Richard R. Grote, Lee C. Bassett, and Gerald G. Lopez
Presentation for Lab-on-a-Chip Seminar at QNF, Eric D. Johnston
Torrey Pines Scientific Hotplate Calibration, GERALD G. LOPEZ
ZEP520A Spin Curves and Dilution Characterization, Gerald G. Lopez Ph.D.
Elionix ELS-7500EX: Field Size Analysis, Gerald G. Lopez Ph.D. and Mohsen Azadi
PMMA A2 Contrast Curves, Gerald G. Lopez Ph.D. and Mohsen Azadi
ZEP520A Contrast Curves, Gerald G. Lopez Ph.D. and Mohsen Azadi
PMMA A2 and A4 Spin Curves, Gerald G. Lopez Ph.D. and Mohsen Azadi
Heidelberg DWL66+ S1805 Contrast Curves, Steven Wood and Gerald G. Lopez
Heidelberg DWL66+ S1813 Contrast Curves, Steven Wood and GERALD G. LOPEZ
Heidelberg DWL66+ S1818 Contrast Curves, Steven Wood and GERALD G. LOPEZ
MicroChem S1800 Series Resist Application onto Si, Steven Wood and GERALD G. LOPEZ
SUSS MicroTec MA6 Gen3 – MicroChem SPR-220 7.0 Thickness vs. Dose-to-Clear and Contrast Curve Data, Steven Wood and Gerald G. Lopez
Directed Self-Assembly of Block Copolymer, No1, Hiromichi Yamamoto
Submissions from 2015
PDMS-Glass Bonding Protocol - Technics, Ravit Dung and Justin Wen
PDMS-PDMS Bonding Protocol - Technics, Steven Henry
KMPR Delamination Resistance Study Report, Steven Henry and Eric Johnston
SU-8 Delamination Resistance Study Report, Steven Henry, Eric Johnston, and Justin Wen
Photomask Defects Report, Steven Henry and Justin Wen
Channel Shape Study Report, Justin Wen
PDMS-Glass Bonding Protocol - Anatech, Justin Wen
PDMS-PDMS Bonding Protocol - Anatech, Justin Wen
Priming Methods for PDMS Devices Study Report, Justin Wen
Stress Fracture Study Report, Justin Wen
T-Topping Study Report, Justin Wen