Quattrone Nanofabrication Facility

Quattrone Nanofabrication Facility

 

The Quattrone Nanofabrication Facility (QNF), is an open access user facility that provides equipment resources and staff assistance for building devices and structures at the micro- and nanoscale. In addition to supporting academic research, we serve as a regional resource in welcoming all projects from other universities, industry and national laboratories.

Follow


Submissions from 2016

PDF

Heidelberg DWL66+ S1818 Contrast Curves, Steven Wood and GERALD G. LOPEZ

PDF

MicroChem S1800 Series Resist Application onto Si, Steven Wood and GERALD G. LOPEZ

PDF

SUSS MicroTec MA6 Gen3 – MicroChem SPR-220 7.0 Thickness vs. Dose-to-Clear and Contrast Curve Data, Steven Wood and Gerald G. Lopez

PDF

Reactive Ion Etch (RIE) of Silicon and ZEP520A Resist Mask with Tetrafluoromethane (CF4) Using Oxford 80 Plus, Steven Wood, Gerald G. Lopez, and Meredith Metzler

PDF

Directed Self-Assembly of Block Copolymer, No1, Hiromichi Yamamoto

Submissions from 2015

PDF

Performance Check 1 on MA6 Mask Aligner, Jonathan Bryan

PDF

PDMS-Glass Bonding Protocol - Technics, Ravit Dung and Justin Wen

PDF

1. Dry Etching of SiO2, SiNx, and Si using 80plus Reactive Ion Etcher, Prashanth Gopalan

PDF

PDMS-PDMS Bonding Protocol - Technics, Steven Henry

PDF

KMPR Delamination Resistance Study Report, Steven Henry and Eric Johnston

PDF

SU-8 Delamination Resistance Study Report, Steven Henry, Eric Johnston, and Justin Wen

PDF

Photomask Defects Report, Steven Henry and Justin Wen

PDF

Performance Check 1 on Elionix E-beam writer, Jisoo Kang

PDF

Deep Silicon Etching using TRION, Zisong Nie

PDF

Deposition Rate and Surface Roughness of Ti films prepared by Explorer14 Magnetron Sputterer, Zisong Nie

PDF

Deposition Rate, Surface Roughness, Morphology, and Film Stress of Al films prepared by Explorer14 Magnetron Sputterer, Zisong Nie

PDF

Film Stress of Ti film prepared by PVD75 e-beam evaporator, Zisong Nie

PDF

Growth rates and Pinholes of ALD SiO2, Al2O3, TiO2, and HfO2 films, Zisong Nie

PDF

Surface Roughness and Morphology of Au film prepared by PVD75 e-beam evaporator, Zisong Nie

PDF

Surface Roughness of ALD films, Zisong Nie

PDF

Temperature dependence of ALD SiO2 growth, Zisong Nie

PDF

Thickness and Permeability (against XeF2) of Parylene C film using Parylene Coater, Zisong Nie

PDF

Al (confocal) deposition rate 1 using Explorer14 magnetron sputterer, Swapil Paliwal

PDF

Deposition rate of Ti film prepared by Explorer14 magnetron Sputterer, Swapil Paliwal

PDF

Thicknesses and Pinholes of SiO2, SiNx, and a-Si Films prepared by PECVD, No 1, Swapil Paliwal

PDF

Film stress of Ti films prepared by Explorer14 Magnetron Sputterer, Swapil Paliwal and Zisong Nie

PDF

Preparation of High Stress Silicon Nitride film using PECVD, Chia-Hsing Pi

PDF

Atomic Layer Deposition-1, growth rate and uniformity of Al2O3, Dhruv Turakhia

PDF

Deposition Rates 2 on PVD75 DC/RF Magnetron Sputterer, Dhruv Turakhia

PDF

Deposition Rates 3 on PVD75 DC/RF Magnetron Sputterer, Dhruv Turakhia

PDF

Deposition Rates on PVD75 Magnetron Sputterer, Dhruv Turakhia

PDF

Thicknesses and Pinholes of SiO2, SiNx, and a-Si Films prepared by PECVD, No 2, Dhruv Turakhia

PDF

Thickness Measurement on Ti, Au, Pd, and Cr using PVD75 E-beam Evaporator, Dhruv Turakhia

PDF

2. Dry Etching of SiO2, SiNx, and Si using 80plus Reactive Ion Etcher, Meet Vora

PDF

Channel Shape Study Report, Justin Wen

PDF

PDMS-Glass Bonding Protocol - Anatech, Justin Wen

PDF

PDMS-PDMS Bonding Protocol - Anatech, Justin Wen

PDF

Priming Methods for PDMS Devices Study Report, Justin Wen

PDF

Stress Fracture Study Report, Justin Wen

PDF

T-Topping Study Report, Justin Wen

Link

Standard Operating Procedures of Tools in Quattrone Nanofabrication Facility, Hiromichi Yamamoto

PDF

Statistical Process Control of 80plus Reactive Ion Etcher, Hiromichi Yamamoto

PDF

Statistical Process Control of Alignment Module of NX2600, Hiromichi Yamamoto

PDF

Statistical Process Control of PECVD, Hiromichi Yamamoto

PDF

Performance Check on ABM3000HR Mask Aligner, Lin Zhao and Prashanth Gopalan