Reactive Ion Etch (RIE) of Silicon Nitride (SiNx) with Trifluoromethane and Oxygen (CHF3/O2)
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Quattrone Nanofabrication Facility
Quattrone Nanofabrication Facility
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Nanoscience and Nanotechnology
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Metzler, Meredith
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Abstract
This report discusses the CHF3/O2 etch process of SiNx using the Oxford 80 Plus RIE.
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2016-05-07