Fabrication of a Dual-Tier Thin Film Micro Polarization Array

dc.contributor.authorGruev, Viktor
dc.contributor.authorOrtu, Alessandro
dc.contributor.authorVan der Spiegel, Jan
dc.contributor.authorLazarus, Nathan
dc.contributor.authorEngheta, Nader
dc.date2023-05-17T00:48:50.000
dc.date.accessioned2023-05-22T19:07:06Z
dc.date.available2023-05-22T19:07:06Z
dc.date.issued2007-04-16
dc.date.submitted2007-06-20T12:25:06-07:00
dc.description.abstractA thin film polarization filter has been patterned and etched using reactive ion etching (RIE) in order to create 8 by 8 microns square periodic structures. The micropolarization filters retain the original extinction ratios of the unpatterned thin film. The measured extinction ratios on the micropolarization filters are ~1000 in the blue and green visible spectrum and ~100 in the red spectrum. Various gas combinations for RIE have been explored in order to determine the right concentration mix of CF4 and O2 that gives optimum etching rate, in terms of speed and under-etching. Theoretical explanation for the optimum etching rate has also been presented. In addition, anisotropic etching with 1μm under cutting of a 10μm thick film has been achieved. Experimental results for the patterned structures under polarized light are presented. The array of micropolarizers will be deposited on top of a custom made CMOS imaging sensor in order to compute the first three Stokes parameters in real time.
dc.description.commentsPostprint version. This paper was published in Optics Express, Volume 15, Issue 8, April 2007, pages 4994-5007 and is made available as an electronic reprint with the permission of OSA. The paper can be found at the following URL on the OSA website: http://www.opticsinfobase.org/abstract.cfm?URI=oe-15-8-4994. Systematic or multiple reproduction or distribution to multiple locations via electronic or other means is prohibited and is subject to penalties under law.
dc.identifier.urihttps://repository.upenn.edu/handle/20.500.14332/33433
dc.legacy.articleid1266
dc.legacy.fulltexturlhttps://repository.upenn.edu/cgi/viewcontent.cgi?article=1266&context=ese_papers&unstamped=1
dc.relation.urlhttps://repository.upenn.edu/cgi/viewcontent.cgi?filename=0&article=1266&context=ese_papers&type=additional
dc.relation.urlhttps://repository.upenn.edu/cgi/viewcontent.cgi?filename=1&article=1266&context=ese_papers&type=additional
dc.source.issue240
dc.source.journalDepartmental Papers (ESE)
dc.source.peerreviewedtrue
dc.source.statuspublished
dc.subject.otherpolarimetry
dc.subject.otherpolarization-sensitive devices
dc.subject.otherphotolithography
dc.titleFabrication of a Dual-Tier Thin Film Micro Polarization Array
dc.typeArticle
digcom.contributor.authorGruev, Viktor
digcom.contributor.authorOrtu, Alessandro
digcom.contributor.authorLazarus, Nathan
digcom.contributor.authorisAuthorOfPublication|email:jan@seas.upenn.edu|institution:University of Pennsylvania|Van der Spiegel, Jan
digcom.contributor.authorisAuthorOfPublication|email:engheta@seas.upenn.edu|institution:University of Pennsylvania|Engheta, Nader
digcom.identifierese_papers/240
digcom.identifier.contextkey316450
digcom.identifier.submissionpathese_papers/240
digcom.typearticle
dspace.entity.typePublication
relation.isAuthorOfPublicationf80d7e0a-2fbb-4720-8928-1ba10176c86a
relation.isAuthorOfPublicationf80d7e0a-2fbb-4720-8928-1ba10176c86a
relation.isAuthorOfPublication435d5eeb-38d8-4fb7-a489-008d6c1a081f
relation.isAuthorOfPublication435d5eeb-38d8-4fb7-a489-008d6c1a081f
relation.isAuthorOfPublication.latestForDiscoveryf80d7e0a-2fbb-4720-8928-1ba10176c86a
upenn.schoolDepartmentCenterDepartmental Papers (ESE)
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