Departmental Papers (CBE)
Document Type
Journal Article
Date of this Version
11-14-2008
Abstract
The use of patterned stress fields to direct phase separation in thin film alloys is investigated computationally with Monte Carlo simulations in which atomic interactions are represented by a Lennard-Jones potential.We show that careful design of annealing schedules based on consideration of the system phase diagram can lead to vastly enhanced patterning kinetics. In particular, by avoiding the low temperature formation of highly stable nuclei within the entire system, the kinetics of patterning are accelerated by rapid monomer diffusion, rather than classical Ostwald ripening in which small precipitates must dissolve to feed larger ones.
Recommended Citation
Nieves, A. M., Vitek, V., & Sinno, T. (2008). Monte Carlo Analysis of Stress-Directed Phase Segregation in Binary Thin Film Alloys Under Nonisothermal Annealing. Retrieved from https://repository.upenn.edu/cbe_papers/142
Date Posted: 11 January 2011
This document has been peer reviewed.
Comments
Suggested Citation:
Nieves, A.M., V. Vitek, and T. Sinno. (2008). "Monte Carlo analysis of stress-directed phase segregation in binary thin film alloys under nonisothermal annealing." Applied Physics Letters. 93, 19194.
© 2008 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics. The following article appeared in Applied Physics Letters and may be found at http://dx.doi.org/10.1063/1.3027064.