Reactive Ion Etch (RIE) of Silicon and ZEP520A Resist Mask with Tetrafluoromethane (CF4) Using Oxford 80 Plus

Loading...
Thumbnail Image
Penn collection
Tool Data
Quattrone Nanofabrication Facility
Degree type
Discipline
Subject
Nanoscience and Nanotechnology
Funder
Grant number
License
Copyright date
Distributor
Related resources
Contributor
Abstract

This report discusses the results of etching silicon with electron beam lithography defined features in ZEP520A resist using CF4 in the Oxford 80 Plus RIE.

Advisor
Date Range for Data Collection (Start Date)
Date Range for Data Collection (End Date)
Digital Object Identifier
Series name and number
Publication date
2016-05-12
Volume number
Issue number
Publisher
Publisher DOI
Journal Issue
Comments
Recommended citation
Collection