Reactive Ion Etch (RIE) of Silicon Dioxide (SiO2) with Trifluoromethane and Oxygen (CHF3/O2)

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Quattrone Nanofabrication Facility
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Nanoscience and Nanotechnology
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This report discusses the CHF3/O2 etch process of SiO2 using the Oxford 80 Plus RIE.

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2016-05-07
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