Document Type

Technical Report

Date of this Version

4-28-2016

Facility

Quattrone Nanofabrication Facility

Abstract

This report shows deposition characteristics for aluminum oxide (Al2O3), hafnium oxide (HfO2), and titanium dioxide (TiO2) films deposited in the Cambridge Nanotech Savannah system. A brief study of the presence of pinholes in these films is also presented.

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Date Posted: 28 April 2016