Author(s)

Meet VoraFollow

Document Type

Technical Report

Date of this Version

5-1-2015

Facility

Quattrone Nanofabrication Facility

Creative Commons License

Creative Commons Attribution-Share Alike 4.0 License
This work is licensed under a Creative Commons Attribution-Share Alike 4.0 License.

Keywords

Etch rate, Dry Etching, SiO2, SiNx, Si, 80plus

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Date Posted: 01 May 2015