Optimization of Bilayer Lift-Off Process to Enable the Gap Size of 1μm Using LOR 3A and S1813

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Lift-off process
Bilayer lift-off process
Photolithography
Patterning
S1813
LOR 3A
Development
Biochemical and Biomolecular Engineering
Biological Engineering
Biomaterials
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Abstract

Bilayer lift-off process for 1μm feature size is demonstrated using LOR 3A and S1813 photoresist. The thickness of photoresists was fixed, whereas development time is varied. The process was further investigated by measuring the undercut depth and undercut rate by scanning electron microscopy. An optimized and reproducible recipe is provided.

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2021-01-29
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