Author(s)

Yinong CaoFollow

Document Type

Technical Report

Date of this Version

5-12-2016

Facility

Quattrone Nanofabrication Facility

Creative Commons License

Creative Commons Attribution-Share Alike 4.0 License
This work is licensed under a Creative Commons Attribution-Share Alike 4.0 License.

Keywords

self-aligned double pattern

 

Date Posted: 12 May 2016

 

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