Document Type

Technical Report

Date of this Version

2-18-2016

Facility

Quattrone Nanofabrication Facility

Abstract

The Quattrone Nanofabrication Facility standard operating procedure for the application of MicroChem S1800 series resist onto an Si wafer is provided in this document.

Keywords

S1800, positive resist, SURPASS

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Date Posted: 18 February 2016

 

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