Departmental Papers (MSE)

Document Type

Journal Article

Date of this Version

October 2005

Comments

Postprint version. Published in Journal of Macromolecular Science, Part C: Polymer Reviews, Volume 45, Issue 5, October 2005, pages 351-373.
Publisher URL: http://dx.doi.org/10.1080/15321790500304163

Abstract

It is attractive to produce true three-dimensional (3D) microstructures both rapidly and economically over a large area with negligible defects for a wide range of applications. Multi-beam interference lithography is one of the promising techniques that can create periodic microstructures in polymers without extensive lithography and etching steps. This review discusses the formation of interference patterns, their dependence on beam parameters, the lithographic process, and the applications to the formation of photonic crystals. Various photoresist systems, including thick films of negative-tone and positive-tone photoresists, liquid resins, organic-inorganic hybrids, and holographic polymer-dispersed liquid crystals, are also reviewed.

Keywords

multi-beam interference, lithography, 2D and 3D microstructures, maskless, photoresist, negative-tone, positive-tone, organic-inorganic hybrids, holographic, polymer-dispersed liquid crystals

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Date Posted: 10 November 2006

This document has been peer reviewed.