Departmental Papers (CBE)

Document Type

Journal Article

Date of this Version

March 2003

Abstract

The growth, and reactivity of monolayer V2O5 films supported on TiO2(110) produced via the oxidation of vapor-deposited vanadium were studied using X-ray photoelectron spectroscopy (XPS) and temperature programmed desorption (TPD). Oxidation of vapor-deposited vanadium in 10-7 Torr of O2 at 600 K produced vanadia films that contained primarily V+3, while oxidation in 10-3 Torr at 400 K produced films that contained primarily V+5. The reactivity of the supported vanadia layers for the oxidation of methanol to formaldehyde was studied using TPD. The activity for this reaction was found to be a function of the oxidation state of the vanadium cations in the film.

Comments

Postprint version. Published in Surface Science, Volume 526, Issue 3, 1 March 2003, pages 211-218.
Publisher URL: http://dx.doi.org/10.1016/S0039-6028(03)00006-2

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Date Posted: 20 October 2004

This document has been peer reviewed.