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The growth, and reactivity of monolayer V2O5 films supported on TiO2(110) produced via the oxidation of vapor-deposited vanadium were studied using X-ray photoelectron spectroscopy (XPS) and temperature programmed desorption (TPD). Oxidation of vapor-deposited vanadium in 10-7 Torr of O2 at 600 K produced vanadia films that contained primarily V+3, while oxidation in 10-3 Torr at 400 K produced films that contained primarily V+5. The reactivity of the supported vanadia layers for the oxidation of methanol to formaldehyde was studied using TPD. The activity for this reaction was found to be a function of the oxidation state of the vanadium cations in the film.
Wong, G. S., Concepcion, M. R., & Vohs, J. M. (2003). Reactivity of monolayer V2O5 films on TiO2(110) produced via the oxidation of vapor-deposited vanadium. Retrieved from http://repository.upenn.edu/cbe_papers/7
Date Posted: 20 October 2004
This document has been peer reviewed.